The ALD tool can handle single substrates of up to 300mm diameter, single rectangular substrates of Gen 2 (370 mm x 470 mm), or batches of up to 10 x 8” square substrates.
Processing can be carried out at reaction chamber temperatures of up to 350°c.
The equipment includes three precursor canisters including one capable of elevated temperatures upto 200°c.
Samples can be loaded from an dry/inert nitrogen or argon atmosphere, from an attached glovebox via a loadlock.
